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Riston® Dry films

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Qnity Riston® dry film photoresist revolutionized the way PCBs were fabricated when invented by DuPont 40 years ago. The original dry film photoresist is the industry standard for high yield, productivity, and ease of use in all imaging applications, including the latest industry demands for finer features, higher quality and lower cost in all types of plating and etching applications as well as LDI exposure.

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Riston® PM 200 Plate Master series

Excellent tenting and plating resist with increased flexibility and productivity

Name Etching environment Thickness µm PDF

Acid etching, Plating

38

Acid etching, Plating

50

Plating (Cu, Sn, SnPb)

75

Riston® MM 100 MultiMaster series

General purpose resist with strong performance in high pH alkaline etching and aggressive gold plating environment simplifies the manufacturing operation by eliminating the need for different films in your production line

Name Etching environment Thickness µm PDF

MM 140

High pH alkaline etching and aggressive gold plating

38

MM 150

High pH alkaline etching and aggressive gold plating

50

Riston® MM 700 MultiMaster series

Robust resist-good developing latitude, suitable  for both conventional and DI exposure

Name Thickness µm PDF

 MM 740

High productivity resist, acid and alkaline etching and plating CU, SN

40

Riston® ES 100 series

High productive resist for rapid exposure, development and stripping and fine line innerlayer performance

Name Etching environment Thickness µm PDF

Acid etching

30

Acid etching and Cu, Sn plating

38

Acid etching and Cu, Sn plating

50

Riston® EM 930 EtchMaster series

High productive resist for rapid exposure, development and stripping and fine line innerlayer performance

Name Etching environment Thickness µm PDF

Acid etch

30

Riston® FX 900 Special series

High tech/Fine line resist. Excellent flow during lamination

Name Etching environment Thickness µm PDF

Acid and alkaline etch

30

Acid etch, Plating Cu, SnPb

40

Acid etch, Plating Cu, SnPb

50

Riston® GM 100 Gold Master series

Thick plating film for selective Ni/Au plating and chemical milling

Name Etching environment Thickness µm PDF

Vacuum Lamination, Ni/Au Plating and Chemical Milling

75

Vacuum Lamination, Ni/Au Plating and Chemical Milling

100

Riston® LDI 7000/7200 Laser series

High photospeed resists for direct imaging with Laser or LED

Name Etching environment Thickness µm PDF

Acid and alkaline etching, plating Cu, Sn

30

Acid and alkaline etching, plating Cu, Sn

38

Acid and alkaline etching, plating Cu, Sn

50

Acid and alkaline etching, plating Cu, Sn

62

Acid and alkaline etching, plating Cu, Sn

75

Acid and alkaline etching, plating Cu, Sn

100

Riston® DI3000 Dry Film Photoresist for Multi-layered Boards

Next Generation T/E and P/E direct imaging photoresist. Excellent tenting, chemical resistance and wind operation window enable higher yield.

Features:

  • Superior tenting capability
  • Excellent chemical resistance with no ragged line
  • Wide operation window by fine line capability
  • Capable with i-line & h-line multiple wavelength DI equipment
  • Low sludge/foaming for easy maintenance
Name Etching environment Thickness µm PDF

DI3030

High speed resist, plating Cu, SnPb, Ni/Au, Acid and alkaline etching, chemical milling

30

High speed resist, plating Cu, SnPb, Ni/Au, Acid and alkaline etching, chemical milling

38

High speed resist, plating Cu, SnPb, Ni/Au, Acid and alkaline etching, chemical milling

50

High speed resist, plating Cu, SnPb, Ni/Au, Acid and alkaline etching, chemical milling

62

DI3075

High speed resist, plating Cu, SnPb, Ni/Au, Acid and alkaline etching, chemical milling

75

DI3099

High speed resist, plating Cu, SnPb, Ni/Au, Acid and alkaline etching, chemical milling

100

Riston® FX 250 Special series

Speciality product tough enough to stand up to harsh selective metalization processes, such as electroless nickel immersion gold (ENIG)

Name Etching environment Thickness µm PDF

ENIG and electrolytic Ni/Au plating

50

Riston® TH 1000 Special series

High resolution resist for single- or multiple wavelength on DI exposure by Laser or LED, Ultra fine line adhesion

Name Etching environment Thickness µm PDF

TH 1015

Acid etching, plating Cu, Sn

15

Acid etching, plating Cu, Sn

25

Additional products and information

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